Tab 1
- Magnetron Sputtering HEX-L
- Magnetron Sputtering HEX
- Metal PVD and Graphene CVD
- Reactive Ion Etching
- Dicing Saw
- Surface Profiler
Magnetron Sputtering HEX-L
The Korvus Technology HEX deposition system provides an economical solution for Physical Vapour Deposition (PVD), suitable for teaching and research. Its modular construction allows various vital elements to be exposed, discussed and interacted with, enabling student laboratories to fully explore the mechanical, material and growth elements of thin film research and nano-materials. Our system benefits from a rotatable 4” sample holder with heating capabilities up to 800 oC, and one 2” RF and two 2” DC magnetron, allowing multilayer and/or co-sputtered thin film deposition.
The HEX-L system is allocated for nitride and oxide thin film deposition.
Magnetron Sputtering HEX
Metal PVD and Graphene CVD
Reactive Ion Etching
Dicing Saw
Surface Profiler
How to access
To access our facilities, please email royce@imperial.ac.uk.
.jpg)