See a list of publications below or visit the Photonics academic staff page and click on a particular member of staff to access their personal web page, which includes a list of their own publications.
@article{Woodward:2017:1/011006,
author = {Woodward, RI and Murray, RT and Phelan, CF and de, Oliveira R and Runcorn, T and Kelleher, E and Li, S and de, Oliveira E and Fechine, G and Eda, G and de, Matos CJS},
doi = {1/011006},
journal = {2D Materials},
title = {Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS2 using multiphoton microscopy},
url = {http://dx.doi.org/10.1088/2053-1583/4/1/011006},
volume = {4},
year = {2017}
}
TY - JOUR
AB - We report second- and third-harmonic generation in monolayer MoS2 as a tool for imaging and accurately characterizing the material's nonlinear optical properties under 1560 nm excitation. Using a surface nonlinear optics treatment, we derive expressions relating experimental measurements to second- and third-order nonlinear sheet susceptibility magnitudes, obtaining values of $| {\chi }_{{\rm{s}}}^{(2)}| \ =2.0\times {10}^{-20}$ m2 V−1 and, for the first time for monolayer MoS2, $| {\chi }_{{\rm{s}}}^{(3)}| =1.7\times {10}^{-28}$ m3 V−2. These sheet susceptibilities correspond to effective bulk nonlinear susceptibility values of $| {\chi }_{{\rm{b}}}^{(2)}| =2.9\ \times {10}^{-11}$ m V−1 and $| {\chi }_{{\rm{b}}}^{(3)}| =2.4\times {10}^{-19}$ m2 V−2, accounting for the sheet thickness. Experimental comparisons between MoS2 and graphene are also performed, demonstrating ~3.4 times stronger third-order sheet nonlinearity in monolayer MoS2, highlighting the material's potential for nonlinear photonics in the telecommunications C band.
AU - Woodward,RI
AU - Murray,RT
AU - Phelan,CF
AU - de,Oliveira R
AU - Runcorn,T
AU - Kelleher,E
AU - Li,S
AU - de,Oliveira E
AU - Fechine,G
AU - Eda,G
AU - de,Matos CJS
DO - 1/011006
PY - 2017///
SN - 2053-1583
TI - Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS2 using multiphoton microscopy
T2 - 2D Materials
UR - http://dx.doi.org/10.1088/2053-1583/4/1/011006
UR - http://hdl.handle.net/10044/1/42198
VL - 4
ER -