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Magnetron Sputtering (HIPIMS)

Magnetron Sputtering (HIPIMS) 

The Magnetron Sputtering System is an ultra-high vacuum deposition system.   It consists of three sources for DC and RF magnetron sputtering. It has a 4” in diameter rotating substrate holder with a heating stage to 800°C and RF biasing option. The system has High-Power Impulse Magnetron Sputtering (HiPIMS) deposition capability. It is equipped with two Ionautics’ HiPSTER 1 power supplies with Reactive Sputtering control and a HiPSTER synchronisation unit that allows the user to control the pulsing of both HiPSTER HiPIMS power supplies.

Clean Room Yellow Room Photolithography Suite

Karl Suss Mask Aligner

Easy to use and compact in size, the SUSS MicroTec MJB3 represents the perfect system for laboratories and small-volume production. As an inexpensive photolithography solution, the MJB3 has set industry standards specifically for processing small substrates and pieces up to 100 mm. Equipped with a reliable, high-precision mask alignment and high-resolution printing capability in the submicron range, the MJB3 is unsurpassed by any comparable machine.

Clean Room - E-Beam Lithography Suite

Raith E- Beam Writer

The eLINE Plus is the optimum system for a broad bandwidth of nanofabrication applications with a single multifunctional electron beam lithography (EBL) system.

The advanced lithography infrastructure of eLINE Plus supports both ultra-high-resolution electron beam lithography and large-area nanofabrication. Moreover, eLINE Plus´s multifunctionality unites the worlds of electron beam lithography, nanoengineering, ultra-high resolution, and large-area SEM imaging, including dedicated features for metrology and process control.

eLINE Plus provides the following smart building blocks and concepts:

  • Advanced 30 kV TFE electron optical column technology
  • Innovative and unique stitch-error-free writing strategies
  • Dedicated features for automated waferscale metrology and process control
  • Laser Interferometer Stage
  • Multiple detector concept
  • Multiport vacuum chamber
  • Open and upgradable platform concept
  • Raith NanoSuite: comprehensive software interface with all modules fully integrated

The eLINE Plus is designed for ultimate flexibility and versatility in the field of multi-technique in-situ nanofabrication beyond classical electron beam lithography. Fully equipped with all nanoengineering options, the tool philosophy is aligned with the workflow “fabricate, relocate, modify, measure.”

How to access

To access our facilities, please email royce@imperial.ac.uk.