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Magnetron Sputtering
Location: Clean Room
Magnetron Sputtering (HIPIMS)
The Magnetron Sputtering System is an ultra-high vacuum deposition system.
It consists of three sources for DC and RF magnetron sputtering. It has a 4” in diameter rotating substrate holder with a heating stage to 800°C and RF biasing option. The system has High-Power Impulse Magnetron Sputtering (HiPIMS) deposition capability.
It is equipped with two Ionautics’ HiPSTER 1 power supplies with Reactive Sputtering control and a HiPSTER synchronisation unit that allows the user to control the pulsing of both HiPSTER HiPIMS power supplies.
E-Beam Deposition System
Pulsed Laser Deposition
How to access
To access our facilities, please email royce@imperial.ac.uk.
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