Tabs 1

Magnetron Sputtering

Location: Clean Room 

Magnetron Sputtering  (HIPIMS) 

The Magnetron Sputtering System is an ultra-high vacuum deposition system.   

It consists of three sources for DC and RF magnetron sputtering. It has a 4” in diameter rotating substrate holder with a heating stage to 800°C and RF biasing option. The system has High-Power Impulse Magnetron Sputtering (HiPIMS) deposition capability.

It is equipped with two Ionautics’ HiPSTER 1 power supplies with Reactive Sputtering control and a HiPSTER synchronisation unit that allows the user to control the pulsing of both HiPSTER HiPIMS power supplies.

How to access

To access our facilities, please email royce@imperial.ac.uk.