In this section
@article{Kafizas:2009:10.1039/b817429f,
author = {Kafizas, A and Hyett, G and Parkin, IP},
doi = {10.1039/b817429f},
journal = {Journal of Materials Chemistry},
pages = {1399--1399},
title = {Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a mixed vanadium oxide and vanadium oxynitride thin film},
url = {http://dx.doi.org/10.1039/b817429f},
volume = {19},
year = {2009}
}
TY - JOUR
AB - A novel combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) technique was used to synthesise numerous vanadium oxide and vanadium oxynitride phases on a single film. This is the first example of cAPCVD having been used to synthesise a gradating mixed anion system. The film was characterised by X-ray diffraction (XRD) mapping, Raman, wavelength dispersive X-ray analysis (WDX) and X-ray photoelectron spectroscopy (XPS) analysis of positions along the film’s front edge allowed the chemical composition to be determined and correlated with XRD data. Film thicknesses were determined using side-on scanning electron microscopy (SEM). Functional property mapping of the optical transmittance/reflectance and electrical resistance allowed systematic investigation on the effects of oxygen content within a vanadium oxynitride film. cAPCVD used in conjunction with mapping analysis tools is a shortcut for identifying numerous, phases, compositions and properties and their relationships on a single film, and offers a rapid method for analysis of phase-space.
AU - Kafizas,A
AU - Hyett,G
AU - Parkin,IP
DO - 10.1039/b817429f
EP - 1399
PY - 2009///
SN - 0959-9428
SP - 1399
TI - Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a mixed vanadium oxide and vanadium oxynitride thin film
T2 - Journal of Materials Chemistry
UR - http://dx.doi.org/10.1039/b817429f
VL - 19
ER -
Dr. Andreas Kafizas
Leader - Solar Coatings Group
e-mail: a.kafizas@imperial.ac.uk
tel: +44(0)20 7594 6752
twitter: @CoatingsSolar